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Toshiba to Boost Three-year Capex, Build Fifth Memory Plant in Yokkaichi
May 14, 2010
Japan's Toshiba announced on May 11 that it will boost its three-year capital expenditure by 4% from the previous three-year period to around 1.3 trillion Yen (US$14.1 billion; US$1=92.4 Yen), and an additional 1.07 trillion Yen (US$11.6 billion) will be spent on R&D operations, Nikkei reported. Around 400 billion Yen (US$4.3 billion) to 500 billion Yen (US$5.4 billion) will be earmarked for its chip business, and Toshiba plans to build a fifth NAND flash memory manufacturing facility at its Yokkaichi complex in central Japan.
Aside from the current NAND flash memory, Toshiba plans to develop the more advanced 3D chip technology, which features vertical stacking of chips and components, at a later date at the new plant. Construction on the fifth plant is scheduled for commencement in July this year, and the first-phase production is slated for spring 2011. Initially the production is expected to be in the 20nm class.
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